JPS6195535U - - Google Patents
Info
- Publication number
- JPS6195535U JPS6195535U JP18087884U JP18087884U JPS6195535U JP S6195535 U JPS6195535 U JP S6195535U JP 18087884 U JP18087884 U JP 18087884U JP 18087884 U JP18087884 U JP 18087884U JP S6195535 U JPS6195535 U JP S6195535U
- Authority
- JP
- Japan
- Prior art keywords
- resistance value
- correction circuit
- thermal printer
- value correction
- electrode terminal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Electronic Switches (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18087884U JPS6195535U (en]) | 1984-11-30 | 1984-11-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18087884U JPS6195535U (en]) | 1984-11-30 | 1984-11-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6195535U true JPS6195535U (en]) | 1986-06-19 |
Family
ID=30738437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18087884U Pending JPS6195535U (en]) | 1984-11-30 | 1984-11-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6195535U (en]) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7629267B2 (en) | 2005-03-07 | 2009-12-08 | Asm International N.V. | High stress nitride film and method for formation thereof |
| US8921205B2 (en) | 2002-08-14 | 2014-12-30 | Asm America, Inc. | Deposition of amorphous silicon-containing films |
-
1984
- 1984-11-30 JP JP18087884U patent/JPS6195535U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8921205B2 (en) | 2002-08-14 | 2014-12-30 | Asm America, Inc. | Deposition of amorphous silicon-containing films |
| US7629267B2 (en) | 2005-03-07 | 2009-12-08 | Asm International N.V. | High stress nitride film and method for formation thereof |